Characteristics of unintentionally doped and lightly Si-doped GaN prepared via pulsed sputtering
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چکیده
منابع مشابه
ELECTRON - PHONON SCATTERING IN Si DOPED GaN
Phonon-plasmon scattering in non-resonant Raman spectroscopy is used to determine the free electron concentration in Si doped GaN films. For various doping concentration and variable temperature the correlation with magneto-transport data is established. The freeze-out of the carrier concentration at low temperature is thus observed in a purely optical detection scheme. We observe a very long t...
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Magnetic order in lightly doped La2-xSrxCuO4.
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0026-2714/$ see front matter 2011 Elsevier Ltd. A doi:10.1016/j.microrel.2011.08.009 ⇑ Corresponding author. Tel.: +82 31 290 7139; fax E-mail address: [email protected] (J. Yi). Low temperature polycrystalline silicon (LTPS) thin-film transistors (TFTs) have a high carrier mobility that enables the design of small devices that offer large currents and fast switching speeds. However, the elec...
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ژورنال
عنوان ژورنال: AIP Advances
سال: 2019
ISSN: 2158-3226
DOI: 10.1063/1.5103185